EXPOSURE METHOD, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING ARTICLE

• Main Author: GOTO YOSHIO
• Format: Patent
• Language: English; Japanese
• Published: 10.01.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide an exposure method by which uniformity of line width can be improved by a simple method.SOLUTION: The exposure method comprises illuminating a pattern formed on an original plate to expose a plurality of exposure regions on a substrate, and includes a step of moving the substrate in a period (0 to t) from starting exposure of any region in the plurality of exposure regions until finishing the exposure. A timing twhen the substrate is moved in the above period is determined based on a difference between a width of the pattern formed on the substrate in a first direction on the substrate surface and a width of the pattern in a second direction different from the first direction on the substrate surface.SELECTED DRAWING: Figure 2 【課題】簡易な方法で線幅均一性を改善できる露光方法を提供する。【解決手段】原版に形成されているパターンを照明して、基板上の複数の露光領域を露光する露光方法であって、複数の露光領域のいずれかの領域の露光を開始して終了するまでの期間（０〜ｔ３）に基板を移動させる工程を含み、当該期間において基板を移動させるタイミングｔ４は、基板上に形成されるパターンの、基板の面における第１方向の幅と、第１方向とは異なる基板の面における第２方向の幅と、の差分に基づいて決定される。【選択図】図２