MODEL-BASED PROCESS SIMULATION METHOD

To provide a lithography simulation using a differential model.SOLUTION: A differential model describes differences in imaging characteristics between two scanners associated with tunable and non-tunable settings. A model of one of the two scanners is derived using the differential model and a model...

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Bibliographic Details
Main Authors JIM KOONMEN, RONALDUS GOOSSENS, SHAO WENJIN, YE JUN, CAO YU
Format Patent
LanguageEnglish
Japanese
Published 13.12.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:To provide a lithography simulation using a differential model.SOLUTION: A differential model describes differences in imaging characteristics between two scanners associated with tunable and non-tunable settings. A model of one of the two scanners is derived using the differential model and a model of the other scanner. Similarly, a sensitivity model describes differences in imaging characteristics of one scanner associated with various scanner settings. Further provided is a method for calibrating the differential model and the sensitivity model by comparison with printing results.SELECTED DRAWING: Figure 8 【課題】差分モデルを用いたリソグラフィシミュレーションを提供する。【解決手段】差分モデルは、調整可能なおよび非調整可能な設定に関連する２つのスキャナの結像特性における差を記述する。２つのスキャナのうちの一方のスキャナのモデルは、もう一方のスキャナのモデルと差分モデルとを用いて導出される。同様に、感度モデルは、様々なスキャナ設定に関連する１つのスキャナの結像特性における差を記述する。さらに、プリント結果との比較によって差分モデルと感度モデルを較正する方法が提供される。【選択図】 図８
Bibliography:Application Number: JP20180155777