TRANSPORT DEVICE AND TRANSPORT METHOD

• Main Author: KON MASATO
• Format: Patent
• Language: English; Japanese
• Published: 29.11.2018
• Subjects: BASIC ELECTRIC ELEMENTS; CONVEYING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; HANDLING THIN OR FILAMENTARY MATERIAL; PACKING; PERFORMING OPERATIONS; PNEUMATIC TUBE CONVEYORS; SEMICONDUCTOR DEVICES; SHOP CONVEYOR SYSTEMS; STORING; TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a transport device which inhibits adhesion of particles to a processed object, and to provide a transport method.SOLUTION: A transport device includes: a transport chamber VTM to which a processed object W processed in a processing chamber PM1 is transported; and an ion liquid which is held on an inner wall 22 of the transport chamber VTM and used to adsorb particles in an atmosphere in the transport chamber VTM. The ion liquid is provided over an entire surface of the inner wall 22 of the transport chamber VTM by a liquid retaining member 24 or irregularities. The structure allows the particles in the atmosphere in the transport chamber VTM to be adsorbed in a good state with the ion liquid and effectively inhibits adhesion of the particles to a wafer W. Further, in a handling device serving as a transport mechanism, the liquid retaining member 24 in which the ion liquid is retained may be provided on an outer peripheral surface of the housing, for example, an outer peripheral surface of a robot arm.SELECTED DRAWING: Figure 2 【課題】被処理体へのパーティクルの付着を抑える搬送装置及び搬送方法を提供する。【解決手段】搬送装置は、処理室ＰＭ１で処理される被処理体Ｗが搬送される搬送室ＶＴＭと、搬送室ＶＴＭの内壁２２に保持され、搬送室ＶＴＭ内の雰囲気中のパーティクルを吸着するためのイオン液体と、を備える。イオン液体は、液体保持部材２４または凹凸により搬送室ＶＴＭの内壁２２に全面に亘って設けられる。これにより、搬送室ＶＴＭ内の雰囲気中のパーティクルを、イオン液体によって良好に吸着し、ウェハＷへのパーティクルの付着が効果的に抑えられる。また、搬送機構としてのハンドリング装置には、筐体の外周面、例えばロボットアームの外周面に、イオン液体が保持された液体保持部材２４が設けられてもよい。【選択図】図２