ION BEAM DEVICE

PROBLEM TO BE SOLVED: To provide an ion beam device capable of reducing damage to a sample and switching observation and processing in a short time.SOLUTION: An ion beam device according to the present invention switches between an operation mode for performing irradiation with an ion beam containin...

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Bibliographic Details
Main Authors SHICHI HIROYASU, MATSUBARA SHINICHI, KAWANAMI YOSHIMI
Format Patent
LanguageEnglish
Japanese
Published 15.11.2018
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:PROBLEM TO BE SOLVED: To provide an ion beam device capable of reducing damage to a sample and switching observation and processing in a short time.SOLUTION: An ion beam device according to the present invention switches between an operation mode for performing irradiation with an ion beam containing the largest amount of H3+ ions and an operation mode for performing irradiation with an ion beam containing the largest number of ions heavier than H3+.SELECTED DRAWING: Figure 3B 【課題】試料に対して与えるダメージを軽減するとともに、観察と加工を短時間で切り替えることができるイオンビーム装置を提供する。【解決手段】本発明に係るイオンビーム装置は、Ｈ３＋イオンを最も多く含むイオンビームを照射する動作モードと、Ｈ３＋よりも重いイオンを最も多く含むイオンビームを照射する動作モードを切り替える。【選択図】図３Ｂ
Bibliography:Application Number: JP20170082547