FOCUSED ION BEAM DEVICE
PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of suppressing slow-down of a tip of an emitter.SOLUTION: A focused ion beam device performs a first maintenance processing for cooling an emitter by a cooling device after a temperature of the emitter and a temperature of an inner s...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Japanese |
Published |
25.10.2018
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of suppressing slow-down of a tip of an emitter.SOLUTION: A focused ion beam device performs a first maintenance processing for cooling an emitter by a cooling device after a temperature of the emitter and a temperature of an inner side of a housing cooled with the emitter are raised by a first heating device in each timing when a first period predetermined is passed.SELECTED DRAWING: Figure 4
【課題】エミッターの先端の鈍化を抑制することができる集束イオンビーム装置を提供すること。【解決手段】集束イオンビーム装置は、予め決められた第1期間が経過する毎に、第1加熱装置によってエミッター及びエミッターとともに冷却される筐体の内側の温度を上昇させた後、冷却装置によってエミッターを冷却する第1メンテナンス処理を行う。【選択図】図4 |
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Bibliography: | Application Number: JP20170062505 |