FOCUSED ION BEAM DEVICE

PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of suppressing slow-down of a tip of an emitter.SOLUTION: A focused ion beam device performs a first maintenance processing for cooling an emitter by a cooling device after a temperature of the emitter and a temperature of an inner s...

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Bibliographic Details
Main Authors MATSUDA OSAMU, NAGAHARA KOJI, KOSAKAI TOMOKAZU, KAWANAMI YOSHIMI, OBA HIROSHI, SHIINA KENSUKE
Format Patent
LanguageEnglish
Japanese
Published 25.10.2018
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Summary:PROBLEM TO BE SOLVED: To provide a focused ion beam device capable of suppressing slow-down of a tip of an emitter.SOLUTION: A focused ion beam device performs a first maintenance processing for cooling an emitter by a cooling device after a temperature of the emitter and a temperature of an inner side of a housing cooled with the emitter are raised by a first heating device in each timing when a first period predetermined is passed.SELECTED DRAWING: Figure 4 【課題】エミッターの先端の鈍化を抑制することができる集束イオンビーム装置を提供すること。【解決手段】集束イオンビーム装置は、予め決められた第1期間が経過する毎に、第1加熱装置によってエミッター及びエミッターとともに冷却される筐体の内側の温度を上昇させた後、冷却装置によってエミッターを冷却する第1メンテナンス処理を行う。【選択図】図4
Bibliography:Application Number: JP20170062505