IMPRINT APPARATUS, DEFECT INSPECTION METHOD, PATTERN FORMATION METHOD, AND ARTICLE MANUFACTURING METHOD

• Main Author: TERAO TSUTOMU
• Format: Patent
• Language: English; Japanese
• Published: 04.10.2018
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PERFORMING OPERATIONS; PHYSICS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TESTING; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PROBLEM TO BE SOLVED: To provide a technology advantageous for improving the detection accuracy of defects in an imprint apparatus.SOLUTION: An imprint apparatus forms a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and hardening the mold. The imprint apparatus includes an imaging unit that images a state where the imprint material on the substrate and the mold are in contact with each other and an inspection unit that inspects a defect in the pattern based on an image captured by the imaging unit. The inspection unit determines a condition for inspecting the defect in the inspection unit such that a difference between an inspection result by the inspection unit and an inspection result of the pattern by a defect inspection apparatus arranged outside becomes small.SELECTED DRAWING: Figure 6 【課題】インプリント装置における欠陥の検出精度の向上に有利な技術を提供する。【解決手段】インプリント装置は、基板の上のインプリント材に型を接触させ硬化させることによって前記基板の上にパターンを形成する。インプリント装置は、前記基板の上のインプリント材と前記型とが接触した状態を撮像する撮像部を含み、前記撮像部によって撮像された画像に基づいて前記パターンにおける欠陥を検査する検査部とを備える。前記検査部は、前記検査部による検査結果と外部に配置された欠陥検査装置による前記パターンの検査結果との差が小さくなるように、前記検査部において欠陥を検査するための条件を決定する。【選択図】図６