LIQUID TREATMENT DEVICE

• Main Authors: KITAI TAKAHIRO, MATSUDA GENICHIRO, YAMADA YOSHIO, MIYAKE TAKESHI
• Format: Patent
• Language: English; Japanese
• Published: 04.10.2018
• Subjects: CHEMISTRY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; METALLURGY; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; TRANSPORTING; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

PROBLEM TO BE SOLVED: To provide a liquid treatment device capable of efficiently generating plasma and quickly treating liquid, and stably generating the plasma for a long time.SOLUTION: There is provided a liquid treatment device, including: a tubular processing tank 12 whose one end along a central axis X1 is closed and whose sectional shape orthogonal to the central axis is circular; a rod-shaped first electrode 30 disposed on one end side of the central axis of the treatment tank; a second electrode 31 disposed on the other end side of the central axis of the processing tank; a power supply 60 for applying a voltage between the first electrode and the second electrode; an electrode rotating device 200 for rotating the first electrode around the central axis of the first electrode; and a liquid inlet 15 for introducing Liquid L1 to one end side of the central axis of the treatment tank from a tangential direction of the circular sectional shape of the processing tank, to thereby swirl the liquid in the treatment tank around the central axis of the treatment tank, and generating a gas phase G in a swirling flow F1 of the liquid.SELECTED DRAWING: Figure 1 【課題】プラズマを効率良く発生させて液体を迅速に処理できるとともに、プラズマを長時間安定して発生させることができる、液体処理装置を提供する。【解決手段】中心軸Ｘ１沿いの一端が閉口しかつ中心軸と直交する断面形状が円形である筒状の処理槽１２と、処理槽の中心軸の一端側に配置されかつ棒形状の第１電極３０と、処理槽の中心軸の他端側に配置される第２電極３１と、第１電極と第２電極との間に電圧を印加する電源６０と、第１電極を第１電極の中心軸周りに回転させる電極回転装置２００とを備え、処理槽の中心軸の一端側に、処理槽の円形の断面形状の接線方向から液体Ｌ１を導入することにより液体を処理槽内で処理槽の中心軸周りに旋回させ、液体の旋回流Ｆ１中に気相Ｇを発生させる液体導入口１５を備える。【選択図】図１