SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD AND COMPUTER READABLE STORAGE DEVICE STORING SUBSTRATE LIQUID PROCESSING PROGRAM

PROBLEM TO BE SOLVED: To prevent failure and the like of a concentration sensor in a substrate liquid processing apparatus.SOLUTION: A substrate liquid processing apparatus of the present embodiment comprises: a process liquid storage part (38) which stores a process liquid for processing a substrat...

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Bibliographic Details
Main Authors SATO HIDEAKI, SATO TAKAZO
Format Patent
LanguageEnglish
Japanese
Published 27.09.2018
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Summary:PROBLEM TO BE SOLVED: To prevent failure and the like of a concentration sensor in a substrate liquid processing apparatus.SOLUTION: A substrate liquid processing apparatus of the present embodiment comprises: a process liquid storage part (38) which stores a process liquid for processing a substrate (8); a process liquid supply part (39) which supplies the process liquid to the process liquid storage part (38); a process liquid discharge part (41) which discharges the process liquid; a concentration sensor (61) which measures a concentration of the process liquid; and a control part (7) which is connected with the concentration sensor (61) to control the process liquid supply part (39) and the process liquid discharge part (41). The control part (7) causes the process liquid discharge part (41) to discharge the process liquid and causes the process liquid supply part (39) to supply new process liquid and causes only part of the process liquid to wet the concentration sensor (61) to measure a concentration of the process liquid to reduce the process liquid to wet the concentration sensor (61) to be less than the process liquid discharged by the process liquid discharge part (41).SELECTED DRAWING: Figure 2 【課題】基板液処理装置において、濃度センサの故障等を防止する。【解決手段】本発明では、基板(8)を処理するための処理液を貯留する処理液貯留部(38)と、前記処理液貯留部(38)に前記処理液を供給する処理液供給部(39)と、前記処理液を排出させる処理液排出部(41)と、前記処理液中の濃度を計測する濃度センサ(61)と、前記濃度センサ(61)と接続され、前記処理液供給部(39)と処理液排出部(41)とを制御する制御部(7)とを有し、前記制御部(7)は、前記処理液を前記処理液排出部(41)から排出させるとともに、前記処理液供給部(39)から新たな前記処理液を供給させ、前記処理液の一部だけを前記濃度センサ(61)に接液させて前記処理液中の濃度を計測させて前記処理液排出部(41)から排出される前記処理液よりも前記濃度センサ(61)に接液させる前記処理液が少なくなるようにした。【選択図】図2
Bibliography:Application Number: JP20180129797