DIELECTRIC LAYER, OPTICAL RECORDING MEDIUM, SPUTTERING TARGET AND OXIDE

PROBLEM TO BE SOLVED: To provide a dielectric layer capable of satisfactorily recording information in an oxide type recording layer directly laminated, and not need for measures to prevent health problems, and having high durability.SOLUTION: Dielectric layers 3 and 5 are formed of oxide containing...

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Bibliographic Details
Main Author TAUCHI HIRONORI
Format Patent
LanguageEnglish
Japanese
Published 30.08.2018
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Summary:PROBLEM TO BE SOLVED: To provide a dielectric layer capable of satisfactorily recording information in an oxide type recording layer directly laminated, and not need for measures to prevent health problems, and having high durability.SOLUTION: Dielectric layers 3 and 5 are formed of oxide containing at least one element of Sn element, Zn element, Zr element, Si element and Ga element, and for all elements other than oxygen in oxide, if the content of Sn element is a mol%, the content of Zn element is b mol%, the content of Zr element is c mol%, the content of Si element is d mol%, and the content of Ga is e mol%, satisfy the following formulas (1) to (7). 0≤b/(a+b)≤0.6...(1), 0≤(c+d)/(a+b+c+d+e)≤0.5...(2), 0≤b≤50...(3), 0≤c≤40...(4), 0≤d≤45...(5), 0≤e≤40...(6), 20≤b+c+d+e≤80...(7)SELECTED DRAWING: Figure 1 【課題】直接積層する酸化物系記録層において良好な情報記録が可能であり、健康障害防止対策の必要がなく耐久性が高い誘電体層を提供する。【解決手段】誘電体層3、5はSn元素、Zn元素、Zr元素、Si元素及びGa元素のうち少なくとも1種の元素とを含有する酸化物から形成され、酸化物の酸素以外の全元素に対しSn元素の含有率をaモル%、Zn元素の含有率をbモル%、Zr元素の含有率をcモル%、Si元素の含有率をdモル%、Ga元素の含有率をeモル%とした場合に、下記式(1)から(7)を満たす。0≦b/(a+b)≦0.6・・・(1)、0≦(c+d)/(a+b+c+d+e)≦0.5・・・(2)、0≦b≦50・・・(3)、0≦c≦40・・・(4)、0≦d≦45・・・(5)、0≦e≦40・・・(6)、20≦b+c+d+e≦80・・・(7)【選択図】図1
Bibliography:Application Number: JP20170031367