OBJECT HOLDER AND LITHOGRAPHIC APPARATUS

• Main Authors: STEFFENS KOEN, CORTILE ROGER HENDRIKUS MAGDALENA, JOHANNES HENRICUS WILHELMUS JACOBS, BLOKS RUUD HENDRIKUS MARTINUS JOHANNES, TROMP SIEGFLIED ALEXANDER, THEODORUS WILHELMUS POLET, RAYMOND WILHELMUS LOUIS LAFARRE, LAURENT THIBAUD SIMON MATTHEW, HOUBEN MARTIJN, HAN HENRICUS ALDEGONDA LEMPENS, JIM VINCENT OVERKAMP, GERBEN PETERS, VAN VUONG VY, WILHELMUS FRANCISCUS JOHANNES SIMONS
• Format: Patent
• Language: English; Japanese
• Published: 30.08.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide an object holder, a lithographic apparatus, and a device manufacturing method.SOLUTION: An embodiment comprises: an object table WT to support an object W, the object table having a support body 100; an object holder 30 to hold an object; an opening 5 adjacent to an edge of the object holder; and a channel 16 in fluid communication with the opening via a passageway 14, where the channel is defined by a first material which is different from a second material defining the passageway.SELECTED DRAWING: Figure 6 【課題】オブジェクトホルダ、リソグラフィ装置、及びデバイス製造方法を提供する。【解決手段】支持体１００を有する、オブジェクトＷを支持するオブジェクトテーブルＷＴと、オブジェクトを保持するオブジェクトホルダ３０と、オブジェクトホルダの縁部に隣接する開口５と、通路１４を経て開口と流体通路するチャネル１６とを備え、チャネルは通路を画定する第２の材料とは異なる第１の材料によって画定される。【選択図】図６