PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND ARTICLES FORMED THEREFROM

• Main Authors: ONGAYI OWENDI, THACKERAY JAMES W
• Format: Patent
• Language: English; Japanese
• Published: 30.08.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a photoresist suitable for EUV (Extreme Ultraviolet) photoresist development, and a photosensitive copolymer therefor.SOLUTION: The present invention provides a copolymer with a monomer comprising an electron-sensitizing acid deprotectable monomer represented by the following formula (where Rand Rare substituted or unsubstituted Calkyl groups or Ccycloalkyl groups, Ris a substituted or unsubstituted Caromatic-containing group or a cycloaliphatic-containing group, Rand Rmay form a ring, at least one of R, Rand Ris halogenated), and a photoresist composition comprising the copolymer.SELECTED DRAWING: Figure 1 【課題】ＥＵＶ（極紫外線）ホトレジスト現像に適したホトレジスト、そのための感光性コポリマーの提供。【解決手段】以下の式で表される電子感受性酸脱保護性モノマー：（式中、ＲｘおよびＲｙは置換もしくは非置換Ｃ１−１０アルキル基またはＣ３−１０シクロアルキル基であり、Ｒｚは置換もしくは非置換Ｃ６−２０芳香族含有基または環式脂肪族含有基であり、ＲｘおよびＲｙは環を形成することがあり、Ｒｘ、ＲｙおよびＲｚの少なくとも１つはハロゲン化されている）を有するモノマーとの共重合体、該共重合体を含むフォトレジスト。【選択図】図１