LAYOUT PROCESS SUPPORT SYSTEM AND CONTROL METHOD AND PROGRAM

• Main Authors: FUKUI TOSHIKI, HANADA SATOSHI, MASHIO KENJI
• Format: Patent
• Language: English; Japanese
• Published: 09.08.2018
• Subjects: CALCULATING; COMPUTING; COUNTING; DATA PROCESSING SYSTEMS OR METHODS, SPECIALLY ADAPTED FORADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL, SUPERVISORYOR FORECASTING PURPOSES; ELECTRIC DIGITAL DATA PROCESSING; PHYSICS; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE,COMMERCIAL, FINANCIAL, MANAGERIAL, SUPERVISORY OR FORECASTINGPURPOSES, NOT OTHERWISE PROVIDED FOR

PROBLEM TO BE SOLVED: To provide a layout process support system that supports improvement of a layout process and is capable of eliminating reworking at a final stage of the layout process.SOLUTION: A layout process support system comprises a concept database storing a concept mapping each specification item with information indicating improvement or deterioration of the specification item for each different design condition, and an improvement support part that specifies the specification item for which a user wish improvement and notifies a concept of a layout condition by which the specified specification item.SELECTED DRAWING: Figure 1 【課題】設計プロセスの改善を支援し、設計プロセスの終盤で手戻りをなくすことができる設計プロセス支援システムを提供する。【解決手段】異なる設計条件ごとに各仕様項目と当該仕様項目の改善または悪化を示す情報とを対応付けてコンセプトを記憶するコンセプトデータベースと、ユーザが改善を望む前記仕様項目を特定し、特定した仕様項目が改善される設計条件のコンセプトを報知する改善支援部と、を備える設計プロセス支援システム。【選択図】図１