SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To reduce thermal stress applied to an outer peripheral edge of a semiconductor chip when joining an electrode plate and the semiconductor chip with a conductive paste.SOLUTION: A method of manufacturing a semiconductor device comprises an application step, a mounting step, and...

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Bibliographic Details
Main Author SAKAKIBARA AKINORI
Format Patent
LanguageEnglish
Japanese
Published 19.07.2018
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Summary:PROBLEM TO BE SOLVED: To reduce thermal stress applied to an outer peripheral edge of a semiconductor chip when joining an electrode plate and the semiconductor chip with a conductive paste.SOLUTION: A method of manufacturing a semiconductor device comprises an application step, a mounting step, and a curing step. In the application step, a conductive paste containing metal particles is applied to a specific range adjacent to a recess of an electrode plate having the recess on its surface. In the mounting step, a semiconductor chip is mounted on the conductive paste so that an outer peripheral edge of the semiconductor chip is positioned above the recess. In the curing step, the conductive paste is cured by heating the conductive paste while pressurizing the semiconductor chip toward the electrode plate.SELECTED DRAWING: Figure 1 【課題】 導電性ペーストによって電極板と半導体チップを接合するときに、半導体チップの外周縁に加わる熱応力を低減する。【解決手段】 半導体装置の製造方法であって、塗布工程、載置工程及び硬化工程を有する。塗布工程では、表面に凹部を有する電極板の前記凹部に隣接する特定範囲に金属粒子を含む導電性ペーストを塗布する。載置工程では、半導体チップの外周縁が前記凹部上に位置するように前記導電性ペースト上に前記半導体チップを載置する。硬化工程では、前記半導体チップを前記電極板に向かって加圧しながら前記導電性ペーストを加熱することで、前記導電性ペーストを硬化させる。【選択図】図1
Bibliography:Application Number: JP20170001924