RESIN COMPOSITION AND RESIST PATTERN FORMING METHOD

• Main Author: NAMAI HAYATO
• Format: Patent
• Language: English; Japanese
• Published: 17.05.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a resin composition capable of forming a resist pattern excellent in LWR performance, CDU performance, resolution, and rectangularity of a cross-sectional shape while exhibiting excellent depth of focus and exposure latitude.SOLUTION: The resin composition of the present invention contains a first polymer having a structural unit containing a group represented by formula (1) and a solvent and is used as a protective film-forming resin composition for immersion exposure. In the formula (1), R-Rare each independently a hydrogen atom, a fluorine atom, or a C1-20 monovalent organic group, provided that at least one of R-Ris a fluorine atom or a group containing a fluorine atom; Ris a substituted or unsubstituted C1-7 trivalent chain hydrocarbon group; and * represents a site bonded to another moiety of the structural unit.SELECTED DRAWING: None 【課題】優れた焦点深度及び露光余裕度を発揮して、ＬＷＲ性能、ＣＤＵ性能、解像性及び断面形状の矩形性に優れるレジストパターンを形成できる樹脂組成物を提供する。【解決手段】本発明は、下記式（１）で表される基を含む構造単位を有する第１重合体、及び溶媒を含有し、液浸露光用保護膜形成樹脂組成物として用いられる樹脂組成物である。式（１）中、Ｒ１〜Ｒ４は、それぞれ独立して、水素原子、フッ素原子又は炭素数１〜２０の１価の有機基である。但し、Ｒ１〜Ｒ４のうちの少なくとも１つは、フッ素原子又はフッ素原子を含むである。Ｒ５は、置換又は非置換の炭素数１〜７の３価の鎖状炭化水素基である。＊は上記構造単位の他の部分に結合する部位を示す。【選択図】なし