CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BEAM LITHOGRAPHY METHOD

• Main Author: SATO YASUHISA
• Format: Patent
• Language: English; Japanese
• Published: 10.05.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PROBLEM TO BE SOLVED: To prevent degradation of drawing accuracy, by measuring stage position accurately.SOLUTION: A charged particle beam lithography apparatus includes a laser interferometer 70, a waveform variation detector 8, and a drawing section 2 for drawing a pattern by irradiating a specimen W with a charged particle beam. The waveform variation detector 8 separates laser light into laser light for 1 path and laser light for 2 paths, irradiates a reflector 88 placed in a lithography chamber 2a with the separated laser light, and outputs a first beat signal by 1 path interference and a second beat signal by 2 path interference. A drawing control section 3c calculates a waveform variation factor of laser light based on the difference of the first and second beat signals, corrects the positional information of a stage 11 measured by the laser interferometer 70, and controls the drawing section 2 based on the corrected stage position information.SELECTED DRAWING: Figure 2 【課題】ステージ位置を精度良く計測し、描画精度の低下を防止する。【解決手段】本実施形態による荷電粒子ビーム描画装置は、レーザ干渉計７０と、波長変動検出部８と、試料Ｗに荷電粒子ビームを照射してパターンを描画する描画部２とを備える。波長変動検出部８は、レーザ光を１パス用のレーザ光と２パス用のレーザ光とに分離し、描画室２ａ内に配置された反射鏡８８に照射し、１パス干渉による第１ビート信号と２パス干渉による第２ビート信号を出力する。描画制御部３ｃは、第１ビート信号と第２ビート信号との差分に基づいてレーザ光の波長変動係数を算出し、レーザ干渉計７０により計測されたステージ１１の位置情報を補正し、補正後のステージ位置情報に基づいて描画部２を制御する。【選択図】図２