GLASS SUBSTRATE FOR MASK BLANK, SUBSTRATE WITH MULTILAYER REFLECTION FILM, MASK BLANK AND MASK

• Main Authors: SHOKI TSUTOMU, ORIHARA TOSHIHIKO, KAWAHARA AKIHIRO
• Format: Patent
• Language: English; Japanese
• Published: 10.05.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To provide a glass substrate for mask blank high in smoothness of a substrate surface, suitable for forming a reference mark capable of enhancing detection accuracy of defect positions or the like, and further capable of regeneration (reuse) of the glass substrate.SOLUTION: A glass substrate for mask blank 20 has a ground layer 21 formed on a main surface in a side in which a transfer pattern of the glass substrate 11 is formed. A surface of the ground layer 21 has root-mean-square roughness (RMS) of 0.15 nm or less and Rmax/RMS in a relationship between maximum surface roughness (Rmax) and root-mean-square roughness (RMS) of 2 to 10.SELECTED DRAWING: Figure 3 【課題】基板表面の平滑性が高く、欠陥位置等の検出精度を向上できる基準マークを形成するのに好適で、しかも、ガラス基板の再生（再利用）が可能なマスクブランク用ガラス基板を提供する。【解決手段】マスクブランク用ガラス基板２０は、ガラス基板１１の転写パターンが形成される側の主表面上に形成された下地層２１を備える。この下地層２１の表面は、二乗平均平方根粗さ（ＲＭＳ）が０．１５ｎｍ以下であり、最大表面粗さ（Ｒｍａｘ）と二乗平均平方根粗さ（ＲＭＳ）との関係において、Ｒｍａｘ／ＲＭＳが２〜１０である。【選択図】図３