PHOTOSENSITIVE COMPOSITION, AND METHOD FOR FORMING CURED FILM

• Main Authors: TAKEGAWA MASAHIRO, ITO YOSUKE, YAMAGUCHI NAOTO
• Format: Patent
• Language: English; Japanese
• Published: 10.05.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To provide a photosensitive composition which suppresses occurrence of a foreign matter in the photosensitive composition and can satisfactorily resolve a fine pattern, and to provide a method for forming a cured film using the photosensitive composition.SOLUTION: Amine (E) is blended with a photosensitive composition containing an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C) and a solvent (S), and an amount of chloride ions in the photosensitive composition is set at 1,000 mass ppm or less using an oxime ester compound (C1) and a compound (C2) other than the oxime ester compound in combination as the photopolymerization initiator (C).SELECTED DRAWING: None 【課題】感光性組成物中での異物の発生が抑制され、微細なパターンを良好に解像できる感光性組成物と、当該感光性組成物を用いる硬化膜の形成方法とを提供すること。【解決手段】アルカリ可溶性樹脂（Ａ）と、光重合性化合物（Ｂ）と、光重合開始剤（Ｃ）と、溶剤（Ｓ）とを含む感光性組成物に、アミン（Ｅ）を配合し、光重合開始剤（Ｃ）として、オキシムエステル化合物（Ｃ１）と、オキシムエステル化合物以外の化合物（Ｃ２）とを組み合わせて用い、感光性組成物中の塩化物イオン量を１０００質量ｐｐｍ以下とする。【選択図】なし