PHOTOSENSITIVE COMPOSITION, AND METHOD FOR FORMING CURED FILM

PROBLEM TO BE SOLVED: To provide a photosensitive composition which suppresses occurrence of a foreign matter in the photosensitive composition and can satisfactorily resolve a fine pattern, and to provide a method for forming a cured film using the photosensitive composition.SOLUTION: Amine (E) is...

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Bibliographic Details
Main Authors TAKEGAWA MASAHIRO, ITO YOSUKE, YAMAGUCHI NAOTO
Format Patent
LanguageEnglish
Japanese
Published 10.05.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide a photosensitive composition which suppresses occurrence of a foreign matter in the photosensitive composition and can satisfactorily resolve a fine pattern, and to provide a method for forming a cured film using the photosensitive composition.SOLUTION: Amine (E) is blended with a photosensitive composition containing an alkali-soluble resin (A), a photopolymerizable compound (B), a photopolymerization initiator (C) and a solvent (S), and an amount of chloride ions in the photosensitive composition is set at 1,000 mass ppm or less using an oxime ester compound (C1) and a compound (C2) other than the oxime ester compound in combination as the photopolymerization initiator (C).SELECTED DRAWING: None 【課題】感光性組成物中での異物の発生が抑制され、微細なパターンを良好に解像できる感光性組成物と、当該感光性組成物を用いる硬化膜の形成方法とを提供すること。【解決手段】アルカリ可溶性樹脂（Ａ）と、光重合性化合物（Ｂ）と、光重合開始剤（Ｃ）と、溶剤（Ｓ）とを含む感光性組成物に、アミン（Ｅ）を配合し、光重合開始剤（Ｃ）として、オキシムエステル化合物（Ｃ１）と、オキシムエステル化合物以外の化合物（Ｃ２）とを組み合わせて用い、感光性組成物中の塩化物イオン量を１０００質量ｐｐｍ以下とする。【選択図】なし
Bibliography:Application Number: JP20160208090