ZWITTERIONIC PHOTO-DESTROYABLE QUENCHERS

PROBLEM TO BE SOLVED: To provide photo-destroyable quenchers that can improve line width roughness and local dimension uniformity without sacrifice to resolution or sensitivity.SOLUTION: The present invention provides a photo-destroyable quencher of formula (I), a photoresist composition containing...

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Bibliographic Details
Main Authors PAUL J LABEAUME, JAMES F CAMERON
Format Patent
LanguageEnglish
Japanese
Published 26.04.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To provide photo-destroyable quenchers that can improve line width roughness and local dimension uniformity without sacrifice to resolution or sensitivity.SOLUTION: The present invention provides a photo-destroyable quencher of formula (I), a photoresist composition containing the photo-destroyable quencher, an acid-sensitive polymer and a photoacid generator, and a method of making a relief image using the photoresist composition (in formula (I), groups and variables are the same as described in the specification).SELECTED DRAWING: None 【課題】解像度及び感度を犠牲にすることなく、線幅の粗さ、局所寸法均一性を改善することができる、光破壊性クエンチャーを提供する。【解決手段】式（Ｉ）の光破壊性クエンチャー、及び光破壊性クエンチャー、酸感受性ポリマーと光酸発生剤とを含有するフォトレジスト組成物、フォトレジスト組成物によるレリーフ画像の作製方法。（式（Ｉ）の基及び変数は本明細書に記載されたものと同じである。）【選択図】なし
Bibliography:Application Number: JP20170189241