PLASMA LIGHT SOURCE

• Main Author: SODEKODA TATSUYA
• Format: Patent
• Language: English; Japanese
• Published: 26.04.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To extend utilization time for providing stable strength of an extreme-ultraviolet light in an opposed type plasma light source.SOLUTION: A plasma light source has a center electrode 12 and a plurality of external electrodes 14, which extend on a same axis line, a pair of coaxi...