ANODE UNIT AND PLATING DEVICE EQUIPPED WITH THE ANODE UNIT

PROBLEM TO BE SOLVED: To provide an anode unit that can form a metal film with a uniform thickness on a substrate by preventing an extreme drop in current density on the anode.SOLUTION: An anode unit 11 comprises: an anode 2 immersed in plating solution; a base member 14 for holding the anode 2; a f...

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Bibliographic Details
Main Authors SAITO NOBUTOSHI, YASUDA SHINGO, SHIMOYAMA TADASHI, KURIYAMA FUMIO
Format Patent
LanguageEnglish
Japanese
Published 26.04.2018
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Summary:PROBLEM TO BE SOLVED: To provide an anode unit that can form a metal film with a uniform thickness on a substrate by preventing an extreme drop in current density on the anode.SOLUTION: An anode unit 11 comprises: an anode 2 immersed in plating solution; a base member 14 for holding the anode 2; a first anode mask 16 with a ring shape for fixing the peripheral part of the anode 2 onto the base member 14 and shielding the peripheral part of the anode 2 electrically; and a second anode mask 18 with a ring shape for being mounted on the surface of the anode 2 and shielding the central part of the anode 2 electrically.SELECTED DRAWING: Figure 2 【課題】アノード上での電流密度の極端な低下を防止して均一な厚さの金属膜を基板上に形成することができるアノードユニットを提供する。【解決手段】アノードユニット１１は、めっき液に浸漬されるアノード２と、アノード２を保持するためのベース部材１４と、アノード２の周縁部をベース部材１４に固定し、アノード２の周縁部を電気的に遮蔽する環状の第１のアノードマスク１６と、アノード２の表面に取り付けられ、アノード２の中心側部位を電気的に遮蔽する環状の第２のアノードマスク１８とを備える。【選択図】図２
Bibliography:Application Number: JP20160203421