WALL FACE CHIPPING DEVICE AND WALL FACE CHIPPING METHOD
PROBLEM TO BE SOLVED: To provide a wall face chipping device and a wall face chipping method which suppresses that a large constant region not yet chipped is produced along one side edge or along an upper edge of a wall face when travelling a chipping device over the whole of the wall face and secur...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English Japanese |
Published |
19.04.2018
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a wall face chipping device and a wall face chipping method which suppresses that a large constant region not yet chipped is produced along one side edge or along an upper edge of a wall face when travelling a chipping device over the whole of the wall face and secures a travelling resistance due to adsorption and so much straight travelling performance as not to be influenced by jetting reactive force of the chipping part.SOLUTION: A wall face chipping device includes: a chipping part 1 capable of cutting a surface of an object wall W according to a chipping movement of a plurality of swivel units 11; an adsorption part 2 which is adsorbed onto an object wall face FW with such an adsorption force that the own device does not fall; and a travelling device 3 which travels on the object wall face FW while being adsorbed on the wall face. A gravity center G1 of the wall face chipping device 100 is set on the travelling width direction inner side than a width W1 of a chipping range S1 of the chipping part 1, at the same time, all travelling wheels 31 are arranged in a plane on the travelling width direction inner side than the width W1 of the chipping range S1 of the chipping part 1 and all adsorption ranges A2 according to the adsorption part 2 are arranged in a plane so as to enter to the travelling width direction inner side than the width W1 of the chipping range S1 of the chipping part 1.SELECTED DRAWING: Figure 2
【課題】壁面全体にハツリ装置を走行させた場合、壁面の片側辺沿いや上辺沿いに大きな一定のハツリ残し領域が生じることを抑制し、また、吸着による走行抵抗やハツリ部の噴射反力によって影響されないだけの直進走行性を確保する。【解決手段】複数のスイベルユニット11のハツリ動作によって対象壁Wの表面を切削可能なハツリ部1と、自装置が落下しない吸着力で対象壁面FWに吸着する吸着部2と、壁面に吸着させたまま対象壁面FW上で走行させる走行装置3とからなる。ハツリ部1のハツリ範囲S1の幅W1よりも走行幅方向内側に、前記壁面ハツリ装置100の重心位置G1が設定されると共に、ハツリ部1のハツリ範囲S1の幅W1よりも走行幅方向内側に、すべての走行輪31が平面配置されてなり、かつ、ハツリ部1のハツリ範囲S1の幅W1よりも走行幅方向内側に、吸着部2によるすべての吸着範囲A2が入るように平面配置される。【選択図】図2 |
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Bibliography: | Application Number: JP20160202945 |