YTTRIUM FLUORIDE BASED SPRAY COATING AND METHOD FOR MANUFACTURING THE SAME, AND BASE MATERIAL HAVING SPRAY COATING AND METHOD FOR MANUFACTURING THE SAME

• Main Authors: HAYASAKA YUKI, SATO KEISUKE, SAKAMAKI MAKOTO
• Format: Patent
• Language: English; Japanese
• Published: 05.04.2018
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INORGANIC CHEMISTRY; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a yttrium fluoride based spray coating capable of suppressing the occurrence of micro cracks even when heated at a high temperature, and a method for manufacturing the same.SOLUTION: The yttrium fluoride based spray coating includes an orthorhombic yttrium fluoride (YF) crystal phase and an oxy yttrium fluoride (YOF) crystal phase. In an X-ray diffraction spectrum, a diffraction peak intensity at a diffraction angle 2θ=21° ±1° is 40% or less of the maximum peak intensity appearing at a diffraction angle of 28±1°. The method for manufacturing the yttrium fluoride based spray coating includes the step of thermally spraying a raw material including an orthorhombic yttrium fluoride (YF) by high velocity flame spraying (HVOF).SELECTED DRAWING: Figure 2 【課題】高温に加熱してもマイクロクラックの発生を抑制し得るフッ化イットリウム系溶射膜及びその製造方法を提供する。【解決手段】斜方晶のフッ化イットリウム（ＹＦ3）結晶相と、オキシフッ化イットリウム（ＹＯＦ）結晶相とを含むフッ化イットリウム系溶射膜であって、Ｘ線回折スペクトルにおいて、回折角２θ＝２１°±１°における回折ピーク強度が回折角２８±１°に現われる最大ピーク強度の４０％以下であるフッ化イットリウム系溶射膜、及び斜方晶のフッ化イットリウム（ＹＦ3）を含む原料を高速フレーム溶射（ＨＶＯＦ）により溶射する工程を含むフッ化イットリウム系溶射膜の製造方法である。【選択図】図２