SINTERED BODY, SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR

• Main Authors: KAKENO TAKASHI, KAJIYAMA JUN
• Format: Patent
• Language: English; Japanese
• Published: 22.03.2018
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIME, MAGNESIA; METALLURGY; REFRACTORIES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF NATURAL STONE

PROBLEM TO BE SOLVED: To provide a sintered body capable of effectively suppressing variation of bulk resistance on a surface and inside of a sintered body by an IZO target, a sputtering target and a manufacturing method therefor.SOLUTION: A sintered body is the sintered body of oxide consisting of In, Zn and O, and absolute value of a ratio of difference between bulk resistance ratio at a depth position of 1 mm in a thickness direction from a surface of the sintered body Rs and bulk resistance ratio at a depth position of 4 mm in the thickness direction from the surface of the sintered body Rd divided by bulk resistance rate at the depth position of 4 mm Rd, (Rs-Rd)/Rd is 20% or less by percentage.SELECTED DRAWING: None 【課題】ＩＺＯターゲットで、焼結体表面と内部でのバルク抵抗のばらつきを有効に抑制することのできる焼結体、スパッタリングターゲット及びその製造方法を提供する。【解決手段】この発明の焼結体は、Ｉｎ、Ｚｎ、Ｏからなる酸化物の焼結体であって、前記焼結体の表面から厚み方向に１ｍｍの深さ位置でのバルク抵抗率Ｒｓと、前記焼結体の表面から厚み方向に４ｍｍの深さ位置でのバルク抵抗率Ｒｄとの差を、当該４ｍｍの深さ位置でのバルク抵抗率Ｒｄで除した比率（Ｒｓ−Ｒｄ）／Ｒｄの絶対値が、百分率で表して２０％以下である。【選択図】なし