SINTERED BODY, SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
PROBLEM TO BE SOLVED: To provide a sintered body capable of effectively suppressing variation of bulk resistance on a surface and inside of a sintered body by an IZO target, a sputtering target and a manufacturing method therefor.SOLUTION: A sintered body is the sintered body of oxide consisting of...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English Japanese |
Published |
22.03.2018
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | PROBLEM TO BE SOLVED: To provide a sintered body capable of effectively suppressing variation of bulk resistance on a surface and inside of a sintered body by an IZO target, a sputtering target and a manufacturing method therefor.SOLUTION: A sintered body is the sintered body of oxide consisting of In, Zn and O, and absolute value of a ratio of difference between bulk resistance ratio at a depth position of 1 mm in a thickness direction from a surface of the sintered body Rs and bulk resistance ratio at a depth position of 4 mm in the thickness direction from the surface of the sintered body Rd divided by bulk resistance rate at the depth position of 4 mm Rd, (Rs-Rd)/Rd is 20% or less by percentage.SELECTED DRAWING: None
【課題】IZOターゲットで、焼結体表面と内部でのバルク抵抗のばらつきを有効に抑制することのできる焼結体、スパッタリングターゲット及びその製造方法を提供する。【解決手段】この発明の焼結体は、In、Zn、Oからなる酸化物の焼結体であって、前記焼結体の表面から厚み方向に1mmの深さ位置でのバルク抵抗率Rsと、前記焼結体の表面から厚み方向に4mmの深さ位置でのバルク抵抗率Rdとの差を、当該4mmの深さ位置でのバルク抵抗率Rdで除した比率(Rs−Rd)/Rdの絶対値が、百分率で表して20%以下である。【選択図】なし |
---|---|
Bibliography: | Application Number: JP20170245322 |