SEMICONDUCTOR MANUFACTURING APPARATUS

PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus capable of extending service life of a heater at a low cost.SOLUTION: A semiconductor substrate is processed in a reactor. A heater is arranged around the reactor and heats the reactor. The heater includes: a spiral-shaped resi...

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Bibliographic Details
Main Authors UDA YUKIO, INOUE KAZUYA, RYU HIROSHI, KANADA KAZUNORI
Format Patent
LanguageEnglish
Japanese
Published 08.03.2018
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Summary:PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus capable of extending service life of a heater at a low cost.SOLUTION: A semiconductor substrate is processed in a reactor. A heater is arranged around the reactor and heats the reactor. The heater includes: a spiral-shaped resistance heating element 3; an electrode 4 for supplying electric power to the resistance heating element 3; and a heat insulation material 5 surrounding the resistance heating element. The electrode 4 is fixed to the resistance heating element 3 in the inside of the heat insulation material 5, pulled out to the outside of the heat insulation material 5 while passing through an opening provided on the side surface of the heat insulation material 5, and is not fixed to the heat insulation material 5.SELECTED DRAWING: Figure 3 【課題】低コストでヒーターの寿命を延ばすことができる半導体製造装置を提供する。【解決手段】反応炉は半導体基板を処理する。ヒーターは反応炉の周りに配置されて反応炉を加熱する。ヒーターは、螺旋状の抵抗発熱体3と、抵抗発熱体3に電力を供給する電極4と、抵抗発熱体を囲む断熱材5とを有する。電極4は、断熱材5の内側において抵抗発熱体3に固定され、断熱材5の側面に設けられた開口を通って断熱材5の外側に引き出され、断熱材5に固定されていない。【選択図】図3
Bibliography:Application Number: JP20160167112