METHOD FOR FORMING INSULATING LAYER

• Main Author: YAHAGI MITSURU
• Format: Patent
• Language: English; Japanese
• Published: 01.03.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a method for forming a patterned insulating layer.SOLUTION: A method for forming an insulating layer includes: a step (A) of applying a photosensitive insulating layer composition to form a coated film; a step (B) of irradiating the coated film with electromagnetic rays through a mask; a step (C) of developing the coated film irradiated with the electromagnetic rays through the mask, with a developer to form a pattern; and a step (D) of firing the pattern to form an insulating layer, where the photosensitive insulating layer composition is a photosensitive insulating layer composition containing a polymer compound (E) having at least one repeating unit selected from the group consisting of a repeating unit containing an isothiocyanato group blocked by a blocking agent in the molecule and a repeating unit containing an isothiocyanato group blocked by the blocking agent in the molecule, and the developer contains C1-C8 aliphatic alcohol.SELECTED DRAWING: None 【課題】パターニングされた絶縁層を形成する方法を提供すること。【解決手段】（Ａ）感光性絶縁層組成物を塗布し、塗布膜を形成する工程、（Ｂ）マスクを通して電磁線を該塗布膜に照射する工程、（Ｃ）該マスクを通して電磁線が照射された塗布膜を現像液で現像し、パターンを形成する工程、（Ｄ）該パターンを焼成し、絶縁層を形成する工程、とを含む絶縁層の形成方法において、該感光性絶縁層組成物が、分子内にブロック化剤でブロックされたイソシアナト基を含有する繰り返し単位およびブロック化剤でブロックされたイソチオシアナト基を含有する繰り返し単位とからなる群より選ばれる少なくとも１種の繰り返し単位を有する高分子化合物（Ｅ）を含有する感光性絶縁層組成物であり、且つ、該現像液が、炭素数１〜８の脂肪族アルコールを含有することを特徴とする絶縁層の形成方法。【選択図】なし