CLEANING METHOD FOR SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

• Main Authors: INUKAI MINAKO, OTSUBO KYO, SAKURAI HIDEAKI
• Format: Patent
• Language: English; Japanese
• Published: 15.02.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a cleaning method for substrate, capable of acquiring a substrate having a highly clean pattern surface.SOLUTION: The cleaning method for substrate includes a first cleaning process and a second cleaning process. The first cleaning process cleans a substrate to be pr...