DEVELOPMENT METHOD, DEVELOPMENT APPARATUS, AND STORAGE MEDIUM

• Main Authors: KYODA HIDEJI, TAKIGUCHI YASUSHI, MUTA KOSHI, FUKUDA MASAHIRO, YOSHIHARA KOSUKE, YAMAMOTO TARO
• Format: Patent
• Language: English; Japanese
• Published: 08.02.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a technique capable of, in performing development processing to a substrate, suppressing an amount of developer to be used and liquid splash of the developer from the substrate, and increasing throughput.SOLUTION: A development method includes: a step of holding a substrate W after exposure horizontally to a substrate holding part; a step of supplying developer from a developer nozzle 31 to a part of the substrate to form a liquid puddle 30; a step of rotating the substrate; a step of moving the developer nozzle such that a supply position of the developer on the rotating substrate moves along a radial direction of the substrate and spreading the liquid puddle over the entire surface of the substrate; and a step which is performed in parallel with the step of spreading the liquid puddle over the entire surface of the substrate and in which a contact part 35 that moves together with the developer nozzle and whose surface facing the substrate is smaller than a surface of the substrate, is allowed to contact the liquid puddle.SELECTED DRAWING: Figure 3 【課題】基板の現像処理において、使用する現像液の量及び基板からの現像液の液跳ねを抑え、且つスループットが高くできる技術を提供する。【解決手段】露光後の基板Ｗを基板保持部に水平に保持する工程と、基板の一部に現像液ノズル３１から現像液を供給して液溜まり３０を形成する工程と、基板を回転させる工程と、回転する前記基板における現像液の供給位置が基板の径方向に沿って移動するように、現像液ノズルを移動させて液溜まりを基板の全面に広げる工程と、液溜まりを基板の全面に広げる工程に並行して行われ、現像液ノズルと共に移動し、基板に対向する面が基板の表面よりも小さい接触部３５を、液溜まりに接触させる工程と、を備える。【選択図】図３