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Summary:PROBLEM TO BE SOLVED: To provide a solder resist composition showing low dielectric constant (Dk) and low dielectric loss tangent (Df), and having high developability and high resolution, and photosetting and thermosetting properties.SOLUTION: A solder resist composition contains a photopolymerizable prepolymer of the following structure, a photopolymerizable vinyl monomer, an epoxy compound, a photopolymerization initiator, a filler, catalyst, and an organic solvent.SELECTED DRAWING: None 【課題】低誘電率(Dk)及び低誘電正接(Df)を示す、高現像性高解像度と光及び熱硬化性を備えたソルダーレジスト組成物を提供する。【解決手段】下記構造の光重合性プレポリマー、光重合性ビニルモノマー、エポキシ化合物、光重合開始剤、充填剤、触媒、及び有機溶剤を含有するソルダーレジスト組成物。【選択図】なし
Bibliography:Application Number: JP20160151587