PRODUCTION METHOD OF POLYMER COMPOUND

• Main Authors: NGUYEN KHANHTIN, SHIOZAKI MASAHIRO, ARAI MASATOSHI, ONISHI KOSHI, KOMURO YOSHITAKA, IKEDA TAKUYA, MAEBASHI TAKAYA
• Format: Patent
• Language: English; Japanese
• Published: 25.01.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a production method of a polymer compound that is useful as a base component of a resist composition.SOLUTION: The production method of a polymer compound includes: a step of obtaining a first polymer compound by copolymerizing: an acrylate type monomer (1) that may contain an ester with a repetition number of 2 or less and has a tertiary alkyl ester type acid dissociable group at a terminal thereof, and which may be substituted an α-position with an C1-5 alkyl group or a halogenated alkyl group; and a specific styrene type monomer (2) that may contain an ester with a repetition number of 2 or less and may be connected to a benzene ring via a single bond or a divalent connecting group having a hetero atom, in which a terminal is substituted with an acid dissociable group; and a step of obtaining a second polymer compound by allowing the first polymer compound to react with an acid component.SELECTED DRAWING: None 【課題】レジスト組成物用の基材成分として有用な高分子化合物の製造方法を提供する。【解決手段】繰り返し数が２以下のエステルを含んでもよく、且つ末端に第３級アルキルエステル型酸解離性基を有するα位に炭素数１〜５のアルキル基又はハロゲン化アルキル基で置換してもよいアクリル酸エステル型モノマー（１）と、繰り返し数が２以下のエステルを含んでもよく、ヘテロ原子を含む２価の連結基、又は単結合を介してベンゼン環に連結してよく、且つ末端に酸解離性基で置換した特定のスチレン型モノマー（２）と、を共重合させて第１の高分子化合物を得る工程と、第１の高分子化合物と、酸成分と、を反応させて第２の高分子化合物を得る工程と、を有する、高分子化合物の製造方法。【選択図】なし