WATER-SOLUBLE COMPOSITION, SEMICONDUCTOR PRODUCED THEREWITH, AND METHOD FOR PRODUCING DEVICE
PROBLEM TO BE SOLVED: To provide a water-soluble composition having high water solubility and excellent plasma etching resistance.SOLUTION: A composition contains a first compound, and a photoacid generator. The first compound has a plurality of first units. The plurality of first units each compris...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
11.01.2018
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Subjects | |
Online Access | Get full text |
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