WATER-SOLUBLE COMPOSITION, SEMICONDUCTOR PRODUCED THEREWITH, AND METHOD FOR PRODUCING DEVICE
PROBLEM TO BE SOLVED: To provide a water-soluble composition having high water solubility and excellent plasma etching resistance.SOLUTION: A composition contains a first compound, and a photoacid generator. The first compound has a plurality of first units. The plurality of first units each compris...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
11.01.2018
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a water-soluble composition having high water solubility and excellent plasma etching resistance.SOLUTION: A composition contains a first compound, and a photoacid generator. The first compound has a plurality of first units. The plurality of first units each comprise a carbon atom that is bound to either an amino group that may have at least one substituent other than a hydrogen atom on a nitrogen atom or an oxygen atom bound to a substituent, and a nitrogen atom or an oxygen atom bound to the carbon atom.SELECTED DRAWING: None
【課題】水溶性が高く、且つ、プラズマエッチング耐性に優れた水溶性組成物を提供する。【解決手段】第1の化合物と、光酸発生剤と、を含み、第1の化合物は、複数の第1のユニットを有し、複数の第1のユニットの各々は、窒素原子上に水素原子以外の少なくとも一つの置換基を有していてもよいアミノ基及び置換基に結合した酸素原子のいずれかに結合した炭素原子と、炭素原子に結合した窒素原子又は酸素原子からなる組成物とする。【選択図】なし |
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Bibliography: | Application Number: JP20160129338 |