PHOTOLITHOGRAPHIC METHOD

PROBLEM TO BE SOLVED: To provide a photolithographic method.SOLUTION: A photolithographic method includes: a first step of providing an incident electron beam; a second step of forming a transmission electron beam and a plurality of diffraction electron beams by transmitting a two-dimensional nanoma...

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Bibliographic Details
Main Authors ZHOU DUANLIANG, FAN SHOUSHAN, LIU PENG, CHO ISAMU, LIN XIAO-YANG, JIANG KAILI, ZHANG CHUN-HAI
Format Patent
LanguageEnglish
Japanese
Published 14.12.2017
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:PROBLEM TO BE SOLVED: To provide a photolithographic method.SOLUTION: A photolithographic method includes: a first step of providing an incident electron beam; a second step of forming a transmission electron beam and a plurality of diffraction electron beams by transmitting a two-dimensional nanomaterial through the incident electron beam; a third step of shielding the transmission electron beam; and a fourth step of forming a plurality of diffraction spots by irradiating a surface of a workpiece with the plurality of diffraction electron beams.SELECTED DRAWING: Figure 9 【課題】本発明は、フォトリソグラフィ方法に関する。【解決手段】本発明のフォトリソグラフィ方法は入射電子ビームを提供する第一ステップと、入射電子ビームに二次元ナノ材料を透過させて、透過電子ビーム及び複数の回折電子ビームを形成する第二ステップと、透過電子ビームを遮蔽する第三ステップと、複数の回折電子ビームに加工物の表面を照射させて、複数の回折スポットを形成する第四ステップと、を含む。【選択図】図９
Bibliography:Application Number: JP20170112815