ION MANIPULATION DEVICE FOR GUIDING OR CONFINING ION IN ION PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide an ion manipulation device for guiding or confining ions in an ion processing apparatus.SOLUTION: An ion manipulation device includes: a first circuit board 1a, in which at least one first electrode 5a for manipulating a path of ions is mounted on a mounting surface...

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Bibliographic Details
Main Authors KATTHEW GILL, ROGER GILES
Format Patent
LanguageEnglish
Japanese
Published 24.11.2017
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Summary:PROBLEM TO BE SOLVED: To provide an ion manipulation device for guiding or confining ions in an ion processing apparatus.SOLUTION: An ion manipulation device includes: a first circuit board 1a, in which at least one first electrode 5a for manipulating a path of ions is mounted on a mounting surface of the first circuit board; a second circuit board 1b, in which at least one second electrode 5b for manipulating the path of ions is mounted on a mounting surface of the second circuit board; and at least one bridging electrode 3 for manipulating the path of ions, which is mounted to both the mounting surface of the first circuit board 1a and the mounting surface of the second circuit board 1b, and which is configured to hold the first circuit board 1a and the second circuit board 1b apart from each other in a fixed spatial relationship where the mounting surface of the second circuit board 1b faces toward the mounting surface of the first circuit board 1a.SELECTED DRAWING: Figure 1 【課題】イオン処理装置においてイオンを案内する又は閉じ込めるためのイオン操作装置を提供する。【解決手段】イオン操作装置は、イオンの行路を操作するための少なくとも1つの第1の電極5aがその実装面に取り付けられた第1の回路基板1aと、イオンの行路を操作するための少なくとも1つの第2の電極5bがその実装面に取り付けられた第2の回路基板1bと、イオンの行路を操作するための少なくとも1つのブリッジ電極3であって、第1の回路基板1aの実装面と第2の回路基板1bの実装面の両方に取り付けられ、且つ、第2の回路基板1bの実装面と第1の回路基板1aの実装面が互いに対向する固定的な空間関係となるように第1の回路基板1aと第2の回路基板1bを相互に離間させて保持するように構成された、少なくとも1つのブリッジ電極3とを有する。【選択図】図1
Bibliography:Application Number: JP20170017370