METHOD AND APPARATUS FOR IMPROVING LIFETIME AND PERFORMANCE OF ION SOURCE IN ION INJECTION SYSTEM

• Main Authors: ANTHONY M AVILA, ROBERT KAIM, RICHARD S RAY, SWEENEY JOSEPH D
• Format: Patent
• Language: English; Japanese
• Published: 16.11.2017
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a dopant for improving a lifetime and performance of an ion source in an ion injection system; and to provide ion injection using a dopant gas mixture.SOLUTION: There are provided an ion injection system and a method, capable of improving a lifetime and performance of an ion source in the ion injection system. The ion injection system and the method are executed by using an isotope-concentrated dopant material effective for obtaining such improvement, or by using the dopant material and replenishment gas.SELECTED DRAWING: Figure 1 【課題】イオン注入システム中のイオン源の寿命および性能を向上させるための、ドーパントおよびドーパントガス混合物を使用したイオン注入。【解決手段】イオン注入システムのイオン源の性能および寿命が向上する、イオン注入システムおよび方法であって、そのような向上を得るために有効な、同位体濃縮されたドーパント材料を使用することによる、またはドーパント材料と補給ガスとを使用することによるイオン注入システムおよび方法。【選択図】図１