ORIENTED FILM, MANUFACTURING METHOD THEREOF, RETARDATION FILM, AND MANUFACTURING METHOD THEREOF

• Main Authors: HOSHI MITSUNARI, SUZUKI SHINYA, NOZAKI JIRO, KATAKURA HITOSHI, ODAGIRI HIROKAZU
• Format: Patent
• Language: English; Japanese
• Published: 02.11.2017
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PROBLEM TO BE SOLVED: To provide an oriented film capable of stabilizing dimension of film base material while reducing process steps, a retardation film, and a manufacturing method thereof.SOLUTION: A matrix having fine linear irregularities of order of nanometers on a surface is directly pressed to the surface of the base material film at temperature lower than glass transition temperature of the base material film to transfer a pattern corresponding to the irregularities of the matrix on the surface of the base material film. The irregularities are thus formed inside the base material film without leaving molding strain in an in-plane direction.SELECTED DRAWING: Figure 11 【課題】プロセスステップを削減しつつ、フィルム基材の寸法を安定させることの可能な配向フィルムおよび位相差フィルム並びにそれらの製造方法を提供する。【解決手段】ナノメータオーダの微細な線状の凹凸を表面に有する原盤を、基材フィルムのガラス転移温度よりも低い温度で、基材フィルムの表面に直接、押圧することにより、基材フィルムの表面に、原盤の凹凸に対応するパターンを転写する。これにより、基材フィルムの内部に、面内方向の成形歪みを残留させずに、凹凸を形成する。【選択図】図１１