METHOD FOR MANUFACTURING GLASS-WORK SUBSTRATE, GLASS-WORK SUBSTRATE, MASK BLANKS AND IMPRINT MOLD
PROBLEM TO BE SOLVED: To provide a method for manufacturing a glass-work substrate, which is hard to cause an abnormal deformation in an imprint mold during vacuum suction, and which is difficult for cullet to remain.SOLUTION: A method for manufacturing a glass-work substrate for an imprint mold com...
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Main Authors | , |
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Format | Patent |
Language | English Japanese |
Published |
26.10.2017
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a method for manufacturing a glass-work substrate, which is hard to cause an abnormal deformation in an imprint mold during vacuum suction, and which is difficult for cullet to remain.SOLUTION: A method for manufacturing a glass-work substrate for an imprint mold comprises the steps of: (1) preparing a glass plate having first and second main surfaces opposed to each other; (2) forming, in the second main surface of the glass plate, a concave portion having a bottom face and a side wall surrounding the bottom face; (3) providing a first protection layer in a region in the first main surface of the glass plate, where a mesa is to be formed later, which is to be executed before or after the step (2); and (4) immersing the glass plate in an etching liquid with a second protection layer provided on the second main surface of the glass plate to etch the glass plate.SELECTED DRAWING: Figure 6
【課題】真空吸着の際にインプリントモールドに異常変形が生じ難く、さらにガラス屑が残留し難いガラス加工基板の製造方法。【解決手段】インプリントモールド用のガラス加工基板の製造方法は、(1)相互に対向する第1および第2の主表面を有するガラス板を準備する工程と、(2)前記ガラス板の前記第2の主表面に、底面および該底面を取り囲む側壁を有する凹部を形成する工程と、(3)前記(2)の工程の前、または前記(2)の工程の後に実施される、前記ガラス板の前記第1の主表面の、後にメサが形成される領域に、第1の保護層を設置する工程と、(4)前記ガラス板の前記第2の主表面に第2の保護層が設置された状態で、前記ガラス板をエッチング溶液に浸漬させ、前記ガラス板をエッチングする工程と、を有する。【選択図】図6 |
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Bibliography: | Application Number: JP20160084056 |