FILTER RAISING DEVICE, TREATING LIQUID SUPPLYING DEVICE, FIXTURE UNIT, AND METHOD OF RISING FILTER

• Main Author: KAI AKIKO
• Format: Patent
• Language: English; Japanese
• Published: 19.10.2017
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEMICONDUCTOR DEVICES; SEPARATION; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To rise a filter attached to a treating liquid supplying device that supplies a treating liquid onto a substrate by a small amount of liquid.SOLUTION: A filter raising device M1 comprises: a circulation passage 201 for circulating a liquid for cleaning a filter 200 that removes foreign matters in a processing liquid of a substrate; and pumps P1 and P2 for supplying the liquid to the circulation passage 201. The filter 200 and a cleaning filter 209 for cleaning the liquid are attached to the circulation passage 201 so that the liquid is passed through in the order of the pumps P1 and P2, the filter 200, and the cleaning filter 209. At a rising processing for cleaning the filter 200 prior to usage in a system out of the circulation passage 201, the liquid is circulated until a predetermined condition is satisfied, and is passed through the filter 200 in a state where the filter 200 and the cleaning filter 209 are attached.SELECTED DRAWING: Figure 4 【課題】基板上へ処理液を供給する処理液供給装置に取り付けられるフィルタを少量の液体で立ち上げる。【解決手段】フィルタ立ち上げ装置Ｍ１は、基板の処理液中の異物を除くフィルタ２００を清浄化するための液体が循環する循環系路２０１と、該循環系路２０１に液体を供給するポンプＰ１、Ｐ２と、を備え、循環系路２０１は、フィルタ２００と液体を浄化する浄化フィルタ２０９とが、ポンプＰ１、Ｐ２、フィルタ２００、浄化フィルタ２０９の順に液体が通過するよう取り付けられ、当該循環系路２０１外の系で使用するのに先立ってフィルタ２００を清浄化する立ち上げ処理時に、フィルタ２００及び浄化フィルタ２０９が取り付けられた状態で、所定の条件を満たすまで液体を循環させて、フィルタ２００へ通液させるように構成されている。【選択図】図４