SOLID-STATE LASER AND INSPECTION SYSTEM USING 193-NM LASER

PROBLEM TO BE SOLVED: To provide improved laser systems and associated techniques.SOLUTION: The systems and techniques generate an ultra-violet (UV) wavelength of approximately 193.368 nm from a fundamental vacuum wavelength near 1064 nm. Preferred embodiments separate out (102, 102') an uncons...

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Main Authors FIELDEN JOHN, YUNG-HO ALEX CHUANG, J JOSEPH ARMSTRONG, VLADIMIR DRIBINSKI
Format Patent
LanguageEnglish
Japanese
Published 19.10.2017
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Summary:PROBLEM TO BE SOLVED: To provide improved laser systems and associated techniques.SOLUTION: The systems and techniques generate an ultra-violet (UV) wavelength of approximately 193.368 nm from a fundamental vacuum wavelength near 1064 nm. Preferred embodiments separate out (102, 102') an unconsumed portion of an input wavelength to at least one stage, and redirect (104) that unconsumed portion for use in another stage. The improved laser systems and associated techniques result in less expensive, longer life lasers than those currently being used in the industry.SELECTED DRAWING: Figure 1A 【課題】改良されたレーザーシステムおよび関連する技術を提供する。【解決手段】1064nmに近い基本真空波長から、約193.368nmの紫外線(UV)波長を発生させる。好適な実施形態は、入力波長の未消費の部分を少なくとも一段階に分割し(102, 102′)、別の段階での使用のためにその未消費の部分を向け直す(104)。改良されたレーザーシステムおよび関連する技術は、産業において現在使用されているそれよりも、より安価で、より長寿命のレーザーをもたらす。【選択図】図1A
Bibliography:Application Number: JP20170109074