METHOD FOR MANUFACTURING PARALLAX BARRIER MEMBER, AND PARALLAX BARRIER MEMBER
PROBLEM TO BE SOLVED: To provide a method for manufacturing a parallax barrier member by which a high reflection layer and a black layer can be formed with high positional accuracy.SOLUTION: The method for manufacturing a parallax barrier member includes: a preparation step of preparing a pattern su...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
12.10.2017
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a method for manufacturing a parallax barrier member by which a high reflection layer and a black layer can be formed with high positional accuracy.SOLUTION: The method for manufacturing a parallax barrier member includes: a preparation step of preparing a pattern substrate having a transparent substrate and a high reflection layer comprising metal formed into a pattern on the transparent substrate; an application step of applying a black composition comprising a light-shielding material and a positive photosensitive resin composition on the pattern substrate to form a black composition layer; an exposure step of irradiating the pattern substrate with exposure light through an opposite side of the transparent substrate to the surface where the black composition layer is formed so as to expose the black composition layer along the pattern by use of the high reflection layer; and a development step of developing the black composition layer exposed along the pattern so as to form a black layer having the same pattern as the high reflection layer.SELECTED DRAWING: Figure 2
【課題】高い位置精度で、高反射層およびブラック層を形成することが可能な視差バリア部材の製造方法を提供することを課題とする。【解決手段】透明基材と、上記透明基材上にパターン状に形成され金属を含む高反射層と、を有するパターン基材を準備する準備工程と、上記パターン基材上に、遮光材料およびポジ型感光性樹脂組成物を含むブラック組成物を塗布してブラック組成物層を形成する塗布工程と、上記透明基材の上記ブラック組成物層の形成面側とは反対側から、露光光を照射することにより、上記高反射層を用いて上記ブラック組成物層をパターン状に露光する露光工程と、パターン状に露光された上記ブラック組成物層を現像することにより、上記高反射層と同一のパターンを有するブラック層を形成する現像工程と、を有することを特徴とする視差バリア部材の製造方法を提供することにより上記課題を解決する。【選択図】図2 |
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Bibliography: | Application Number: JP20160075176 |