ION IMPLANTATION DEVICE AND MEASURING APPARATUS
PROBLEM TO BE SOLVED: To provide a technology for accurately measuring an angle centroid of an ion beam.SOLUTION: An angle measuring apparatus 48 comprises: a slit 62 to which an ion beam is incident, a slit width direction of the slit 62 being a direction orthogonal with a beam advancing direction...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
28.09.2017
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Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a technology for accurately measuring an angle centroid of an ion beam.SOLUTION: An angle measuring apparatus 48 comprises: a slit 62 to which an ion beam is incident, a slit width direction of the slit 62 being a direction orthogonal with a beam advancing direction of an ion beam toward a wafer; and multiple electrode bodies 64a-64g provided at positions away from the slit 62 in the beam advancing direction and each including beam measuring surfaces 65a-65g that are exposed regions with respect to the ion beam passed through the slit 62. The multiple electrode bodies 64a-64g are disposed in such a manner that the beam measuring surfaces of the electrode bodies are arranged side by side successively in the slit width direction and that the beam measuring surfaces being adjacent in the slit width direction are displaced in the beam advancing direction.SELECTED DRAWING: Figure 5
【課題】イオンビームの角度重心を正確に測定するための技術を提供する。【解決手段】角度測定装置48は、イオンビームが入射するスリット62であって、スリット幅方向がウェハに向かうイオンビームのビーム進行方向と直交する方向であるスリット62と、スリット62からビーム進行方向に離れた位置に設けられ、それぞれがスリット62を通過したイオンビームに対して露出する領域であるビーム測定面65a〜65gを有する複数の電極体64a〜64gと、を備える。複数の電極体64a〜64gは、各電極体のビーム測定面がスリット幅方向に順に並べられ、スリット幅方向に隣接するビーム測定面がビーム進行方向にずれるように配置される。【選択図】図5 |
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Bibliography: | Application Number: JP20160055822 |