METHODS OF WET-ETCHING SELF-ASSEMBLED MONOLAYER PATTERNED SUBSTRATE AND METAL PATTERNED ARTICLES

• Main Authors: JEFFREY H TOKIE, ZU LIJUN, MATTHEW H FREY, KANG MYUNGCHAN
• Format: Patent
• Language: English; Japanese
• Published: 21.09.2017
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE

PROBLEM TO BE SOLVED: To provide a metal patterned article that has improved uniformity and/or increased thickness over relatively broad ranges.SOLUTION: A metal patterned article includes a substrate and an etched microcontact printed metal pattern disposed on the substrate, wherein a pattern area is at least 25 cm, the pattern has a thickness of at least 100 nanometers and a pattern feature uniformity of at least 75%, and the pattern feature uniformity is determined by measuring with an optical microscope a shortest dimension of a repeating pattern feature from the center of the metal pattern and measuring the shortest dimension of the identical repeating pattern feature at an edge region of the pattern. The difference between the dimensions of the pattern features can be used to calculate a feature uniformity in accordance with the equation: % Uniformity={1-((Absolute Value of Difference in Shortest Feature Dimension Between Center Region and Edge Region)/(Greater of Feature Dimensions for the Center Region and Edge Region)))×100.SELECTED DRAWING: Figure 1 【課題】比較的大きい範囲に亘って向上された均一性及び／又は増大された厚さを有する金属パターン化物品の提供。【解決手段】基材と、基材上に配置されたエッチング化マイクロコンタクト印刷金属パターンとを含む。パターンの範囲が少なくとも２５ｃｍ２であり、パターンが、少なくとも１００ナノメートルの厚さと、少なくとも７５％のパターン構造均一性を有し、パターン構造均一性が、光学顕微鏡を使用して、金属パターンの中心における反復パターン構造の最短寸法を測定し、パターンの縁における同一の反復パターン構造の最短寸法を測定することにより決定され、パターン構造の寸法間の差を用いて下記式に従って構造均一性が計算される金属パターン化物品。％均一性＝｛１−（中心と縁との最短構造寸法における差の絶対値／中心及び縁のより大きい構造寸法）｝×１００【選択図】図１