VAPORIZER AND THIN FILM DEPOSITION DEVICE INCLUDING THE SAME

• Main Authors: NISHIKAWA ICHIRO, SHIN DONG-OK, KIM HO-GON, YOUM JANG-HYOUN, HAMADA MASASHI, CHOI HYOUK YEOL, OH JUNG-SUK, CHOI SANG-JIN, SHIM HYUN-SIK, LEE HEOK-JAE, LEE TAE-HOON, TERASAKA MASAKUNI, KIM JAE-SEOK, LEE JUN-WON, KIM HYOUNG-HO
• Format: Patent
• Language: English; Japanese
• Published: 24.08.2017
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a vaporizer with improved vaporization efficiency.SOLUTION: A vaporizer 100 includes: a first body 111 having an upper part that becomes narrower in a height direction; a second body 116 provided with a cavity in which the first body 111 is housed; and a mixing chamber 120 formed between the first body 111 and the second body 116. The second body 116 includes: a carrier gas injection path 140 which is connected to a carrier gas injection port 145 formed in an upper part of the mixing chamber 120 and where the carrier gas CG to be injected into the mixing chamber 120 moves; a raw material injection path which is connected to a raw material injection port 145 provided to the mixing chamber 120 and where the liquid raw material to be injected to the mixing chamber 120 moves; and an exhaust path 160 which is connected to an exhaust port 165 formed in a lower part of the mixing chamber 120 and where the mixed fluid containing the raw material and the carrier gas CG emitted from the mixing chamber 120 moves.SELECTED DRAWING: Figure 1 【課題】気化効率が向上した気化器を提供する。【解決手段】気化器１００は、高さ方向に狭くなる上段部を有する第１ボディ111、第１ボディ111が収容されるキャビティが形成された第２ボディ116及び第１ボディ111と第２ボディ116との間に形成された混合室120を含む。第２ボディ116は、混合室120の上部に形成されたキャリアガス注入口14５と連結され、混合室120に注入されるキャリアガスＣＧが移動するキャリアガス注入経路140と、混合室120に形成された原料注入口145と連結され前記混合室120に注入される液状の原料が移動する原料の注入経路と、混合室120の下部に形成された排出口165と連結され、混合室120から排出されたキャリアガスＣＧと原料とが混合された混合流体が移動する排出経路１６０とを有する。【選択図】図１