CLEANING SOLUTION FOR LITHOGRAPHY AND CLEANING METHOD

• Main Authors: SUGAWARA MAI, YOKOI SHIGERU
• Format: Patent
• Language: English; Japanese
• Published: 24.08.2017
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DETERGENT COMPOSITIONS; DETERGENTS; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FATTY ACIDS THEREFROM; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

PROBLEM TO BE SOLVED: To provide a cleaning solution for lithography excellent in a corrosion-inhibiting function against at least one metal selected from the group consisting of cobalt, copper and an alloy containing either metal, and a method of cleaning a substrate using the cleaning solution for lithography.SOLUTION: A cleaning solution for lithography contains a basic compound, water, and an imidazole compound represented by the following formula (1a).SELECTED DRAWING: None 【課題】コバルト、銅及びこれらのいずれかの合金からなる群より選択される少なくとも１種の金属に対する腐食抑制機能に優れたリソグラフィー用洗浄液並びにこのリソグラフィー用洗浄液を用いて基板を洗浄する方法を提供する。【解決手段】リソグラフィー用洗浄液は、塩基性化合物、水及び下記式（１ａ）で表されるイミダゾール化合物を含有する。【選択図】なし