METHOD FOR MANUFACTURING LAMINATE AND METHOD FOR MANUFACTURING POLARIZING PLATE, AND LAMINATE

PROBLEM TO BE SOLVED: To provide a laminate formed by laminating a protective film having a low phase difference on a support body without generating a foreign substance and air bubbles.SOLUTION: There is provided a method for manufacturing a laminate formed by laminating a protective film on a peel...

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Bibliographic Details
Main Authors SHIRATORI JIRO, KATO MASAHISA, HAJI KEIICHIRO, KUWABARA MASAOMI
Format Patent
LanguageEnglish
Japanese
Published 24.08.2017
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Summary:PROBLEM TO BE SOLVED: To provide a laminate formed by laminating a protective film having a low phase difference on a support body without generating a foreign substance and air bubbles.SOLUTION: There is provided a method for manufacturing a laminate formed by laminating a protective film on a peelable support body which includes a coating step of applying a monomer-containing resin composition onto a peelable support body, and a polymerization step of polymerizing the monomer-containing resin composition by heating and/or irradiation with energy rays to form the protective film, where the protective film has a retardation value (Re) in an in-plane direction at 23°C and a wavelength of 590 nm of 0 nm or more and 10 nm or less and a retardation value (Rth) in a thickness direction at 23°C and a wavelength of 590 nm of -10 nm or more and 10 nm or less.SELECTED DRAWING: None 【課題】異物や気泡が生じることなく、支持体上に低位相差の保護フィルムが積層された積層体を提供する。【解決手段】本発明の積層体の製造方法は、剥離性支持体上に保護フィルムが積層された積層体の製造方法であって、モノマー含有樹脂組成物を剥離性支持体上に塗布する塗布工程と、加熱および/またはエネルギー線照射によって、上記モノマー含有樹脂組成物を重合させて上記保護フィルムを形成する重合工程とを含み、上記保護フィルムは、23℃で波長590nmにおける面内方向の位相差値(Re)が0nm以上10nm以下であり、かつ、23℃で波長590nmにおける厚み方向の位相差値(Rth)が−10nm以上10nm以下であることを特徴とする、積層体の製造方法。【選択図】なし
Bibliography:Application Number: JP20160027480