EXPOSURE METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD AND MASK

• Main Author: FUKUI TATSUO
• Format: Patent
• Language: English; Japanese
• Published: 20.07.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PROBLEM TO BE SOLVED: To expose the pattern of a mask at a more suitable position of a plate while using a lens array.SOLUTION: An exposure method comprises: arranging a plurality of rectangular masks in a non-scanning direction so that a scanning direction is the longitudinal one; relatively moving an illumination optical system, a lens array, a mask and a plate in the scanning direction along the mask and the plate; irradiating a pattern with illumination light from the illumination optical system; projecting the image of the pattern formed in the mask on the plate through the lens array; and changing an interval between a plurality of masks in the non-scanning direction orthogonal to the scanning direction while relatively moving the illumination optical system, the lens array, the mask and the plate in the scanning direction.SELECTED DRAWING: Figure 1 【課題】レンズアレイを用いつつ、プレートのより適切な位置にマスクのパターンを露光すること。【解決手段】短冊形状の複数のマスクを走査方向が長手となる向きで、非走査方向に沿って配置し、照明光学系及びレンズアレイとマスク及びプレートとを、マスク及びプレートに沿った走査方向に相対的に移動させ、照明光学系からパターンに照明光を照射し、マスクに形成されたパターンの像をレンズアレイを介してプレートに投影することと、照明光学系及びレンズアレイとマスク及びプレートとの走査方向への相対的な移動中に、走査方向に直交する方向である非走査方向における複数のマスクの間隔を変化させることと、を含む。【選択図】図１