MEMS ELEMENT

PROBLEM TO BE SOLVED: To provide a structure of a MEMS element for preventing breakage of a film while improving sensitivity of the MEMS element.SOLUTION: A plurality of slits 4a and 4b are formed adjacently to a movable electrode 3 (diaphragm film), and have a shape having an opening shape with a s...

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Bibliographic Details
Main Author USUI TAKAHIDE
Format Patent
LanguageEnglish
Japanese
Published 06.07.2017
Subjects
BASIC ELECTRIC ELEMENTS
DEAF-AID SETS
ELECTRIC COMMUNICATION TECHNIQUE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKEACOUSTIC ELECTROMECHANICAL TRANSDUCERS
MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES
MICROSTRUCTURAL TECHNOLOGY
PERFORMING OPERATIONS
PUBLIC ADDRESS SYSTEMS
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To provide a structure of a MEMS element for preventing breakage of a film while improving sensitivity of the MEMS element.SOLUTION: A plurality of slits 4a and 4b are formed adjacently to a movable electrode 3 (diaphragm film), and have a shape having an opening shape with a slit width widened on a side opposite to the opposing slit.SELECTED DRAWING: Figure 2 【課題】ＭＥＭＳ素子の感度を向上させながら、膜の破損を防止するＭＥＭＳ素子の構造を提供する。【解決手段】可動電極３（ダイアフラム膜）に複数のスリット４a，４bが隣接して形成されており、対向するスリットとは反対側にスリット幅を拡げた開口形状を備える形状とする。【選択図】図２
Bibliography:Application Number: JP20150257651