POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS

• Main Authors: PARK YOUJUNG, JEONG SEULGI, KIM SUNGHWAN, KIM MIN SU, NAM YOUNHEE
• Format: Patent
• Language: English; Japanese
• Published: 22.06.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

PROBLEM TO BE SOLVED: To provide a polymer having satisfactory heat resistance and etch resistance while ensuring gap-fill characteristics and planarization characteristics, an organic layer composition comprising the polymer, and a method of forming patterns using the organic layer composition.SOLUTION: A polymer includes a structural unit represented by chemical formula 1 in the figure, where the definition of the symbols is the same as that in the specification.SELECTED DRAWING: Figure 1 【課題】本発明は、ギャップフィル特性および平坦化特性を確保しながら、耐熱性および耐エッチング性も満足することができる重合体、前記重合体を含む有機膜組成物、および前記有機膜組成物を用いたパターン形成方法を提供する。【解決手段】本発明の一実施形態に係る重合体は、下記の化学式１で表される構造単位を含む。（前記化学式１の定義は、明細書中の定義と同様である。）【選択図】図１