SUBSTRATE CLEANING DEVICE, SUBSTRATE CLEANING METHOD AND STORAGE MEDIUM

• Main Authors: KANEKO MIYAKO, SUGANO ITARU, ORII TAKEHIKO
• Format: Patent
• Language: English; Japanese
• Published: 15.06.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To remove particles adhering to a substrate, while suppressing pattern collapse or erosion of a base film.SOLUTION: A substrate cleaning device includes a holding mechanism, and a first liquid supply section. The holding mechanism holds a substrate where the film of a process liquid containing a volatile constituent is formed, and the process liquid is solidified or hardened by volatilization of the volatile constituent. The first liquid supply section supplies a removal liquid for melting all process liquid for the substrate held by the holding mechanism, and supplies a rinse liquid for removing the dissolved process liquid and removal liquid, remaining on the substrate, therefrom to the substrate. Furthermore, the holding mechanism has a plurality of first holding parts for holding the peripheral portion of the substrate, and a plurality of second holding parts for holding the peripheral portion of the substrate and capable of operating independently from the first holding parts.SELECTED DRAWING: Figure 10B 【課題】パターン倒れや下地膜の侵食を抑えつつ、基板に付着したパーティクルを除去すること。【解決手段】実施形態に係る基板洗浄装置は、保持機構と、第１の液供給部とを備える。保持機構は、揮発成分を含んだ処理液の膜が形成され揮発成分が揮発することによって処理液が固化又は硬化した基板を保持する。第１の液供給部は、保持機構により保持された基板に対して処理液の全てを溶解させる除去液を供給し、基板上に残存する溶解した処理液及び除去液を基板上から除去するリンス液を基板へ供給する。また、保持機構は、基板の周縁部を保持する複数の第１の保持部と、第１の保持部と独立して動作可能な基板の周縁部を保持する複数の第２の保持部とを有する。【選択図】図１０Ｂ