ELECTROSTATIC CHUCK AND SEMICONDUCTOR MANUFACTURING APPARATUS

PROBLEM TO BE SOLVED: To remove a substrate from an electrostatic chuck in a short time.SOLUTION: A mounting stage 20 of an electrostatic chuck 1, includes a substrate main body 21; and an electrostatic electrode 22 built in the substrate main body 21. The substrate main body 21 is made of ceramic c...

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Bibliographic Details
Main Authors SHIMIZU KAZUNORI, MIYAMOTO KAZUYOSHI, MIYAZAWA MASAKUNI
Format Patent
LanguageEnglish
Japanese
Published 08.06.2017
Subjects
BASIC ELECTRIC ELEMENTS
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To remove a substrate from an electrostatic chuck in a short time.SOLUTION: A mounting stage 20 of an electrostatic chuck 1, includes a substrate main body 21; and an electrostatic electrode 22 built in the substrate main body 21. The substrate main body 21 is made of ceramic containing an aluminium oxide (AlO) as a main component. The ceramic for forming substrate main body 21 contains magnesia oxide (MgO), yttrium oxide (YO), and calcium oxide (CaO). A content rate of calcium oxide is set to (CaO) 0.4 wt% to 0.6 wt%.SELECTED DRAWING: Figure 1 【課題】静電チャックから基板を短時間で脱離させること。【解決手段】静電チャック１の載置台２０は、基板本体２１と、基板本体２１に内設された静電電極２２を含む。基板本体２１は、酸化アルミニウム（Ａｌ２Ｏ３）を主成分とするセラミックスから形成されている。また、基板本体２１を形成するセラミックスは、酸化マグネシウム（ＭｇＯ）、酸化イットリウム（Ｙ２Ｏ３）、及び酸化カルシウム（ＣａＯ）を含む。そして、酸化カルシウム（ＣａＯ）の含有率が０．４ｗｔ％〜０．６ｗｔ％に設定されている。【選択図】図１
Bibliography:Application Number: JP20150236642